Equipment Type
Base hood, Acid hood, Solvent hood

Manufacturer
Air Control

Processes
Wet etching, cleaning, lithography preparation

Three Air Control wet benches are located in the cleanroom. The Acid hood is configured with a heated quartz bath for use with phosphoric acid etch and an ambient PVDF Bath for use with HF acid. The Acid hood also contains a quick dump rinse tank. The solvent hood is equipped with CO2 Fire suppression system.

Multiple hotplates and one ultrasonic cleaner are located on the wet benches.